A Leader in C4F8 Gas Production for Semiconductor Community
As the largest producer of high-purity perfluorocarbon compounds (PFC) in North America, Electronic Fluorocarbons is focused on serving the needs of the semiconductor community. We’ve adjusted our processes to be a leader in C4F8 gas production.
We serve the semiconductor market by developing a new generation of PFCs with the highest quality to meet the tight specification requirements of the semiconductor industry. Our ISO 9001:2015 specialty gas plant has complete in-house analytical capability to track impurity profiles and produce the highest quality product.
In dry etching processes, Cyclo-C4F8 or R318, Halocarbon 318, a perfluorocarbon compound is commonly used as a reactant gas in the etching of oxide and nitride. As chip density increases, dry etching requires greater precision and selectivity in deep aspect ratios and tight geometries. To achieve this, octafluorocyclobutane (c-C4F8) is widely used as an etching gas instead of conventional CF4, because the relatively high C/F ratio of C4F8 induces the formation of a C:F film on Si or SiN, which acts as an etching barrier, thus improving the selectivity.
More C4F8 Gas Capability With Our Thirty-Foot Distillation Column
Electronic Fluorocarbons has doubled its capacity to produce C4F8 and implemented quality improvements to ensure its highest purity through the construction of a dedicated thirty-foot distillation column. This in-house storage of raw material creates shorter lead times and allows for further streamlining of the purification process. For customers with a well-established business continuity plan, we guarantee that our domestic on-hand product provides security in the supply chain.
A new Agilent GC-PDHID analytical instrument enables Electronic Fluorocarbons to provide various grades of the product ranging from 99.9% – 99.999% (3N-5N) purity. These high purity product lines support not only our electronic customers but applications of C4F8 gas in other non-semiconductor industries.
Octafluorocyclobutane C4F8 gas has been broadly adapted in the semiconductor industry as a CVD (Chemical Vapor Deposition) chamber clean chemistry, replacing C2F6. Chamber clean chemistries using C4F8 as a replacement for C2F6 have a higher utilization rate and subsequently a lower emission of PFC (perfluorocarbons) from the semiconductor process tools.
Octafluorocyclobutane is a colorless, odorless, non-toxic, non-flammable liquefied gas. It is shipped as a liquefied gas under its own vapor pressure (25 psig @ 70º F). To find full specs, or to download our SDS, click here.
EFC C4F8 Gas Specifications (5N)
